Impact of cyclic plasma treatment on oxygen vacancy defects in TiN/HfZrO/SiON/Si gate stacks

Md Nasir Uddin Bhuyian, S. Poddar, D. Misra, K. Tapily, R. D. Clark, S. Consiglio, C. S. Wajda, G. Nakamura, G. J. Leusink

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Physics & Astronomy