Influence of gas flow rate on the formation of ZnO nanorods and their effects on photoelectrochemical response

Sudhakar Shet, Kwang Soon Ahn, Ravindra Nuggehalli, Yanfa Yan, Todd Deutsch, John Turner, Mowafak Al-Jassim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

ZnO thin films are deposited in pure Ar and mixed Ar and N2 gas ambient at substrate temperature of 500°C by rf sputtering ZnO targets. All the films were deposited on fluorine doped tin oxide coated glass. We find that the presence of optimum N2 to Ar ratio in the deposition ambient promotes the formation of well aligned ZnO nanorods. ZnO thin films grown at 25 % N2 gas flow rate promoted aligned nanorods along c-axis exhibit significantly enhanced photoelectrochemical response, as compared to ZnO thin films grown at other N2 to Ar gas flow ratios. Our results suggest that chamber ambient is very important for the formation of aligned nanostructures, which offer potential advantages for improving the efficiency of photoelectrochemical water splitting for H2 production.

Original languageEnglish (US)
Title of host publicationAdvances in Materials Science for Environmental and Nuclear Technology
PublisherAmerican Ceramic Society
Pages267-274
Number of pages8
ISBN (Print)9780470927298
DOIs
StatePublished - Jan 1 2010

Publication series

NameCeramic Transactions
Volume222
ISSN (Print)1042-1122

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Materials Chemistry

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