Infrared dielectric response of nanoscribe IP-dip and IP-L monomers after polymerization from 250 cm-1 to 6000 cm-1

Daniel B. Fullager; Glenn D. Boreman; Tino Hofmann

doi:10.1364/OME.7.000888

Infrared dielectric response of nanoscribe IP-dip and IP-L monomers after polymerization from 250 cm^-1 to 6000 cm^-1

Daniel B. Fullager
, Glenn D. Boreman
, Tino Hofmann

Research output: Contribution to journal › Article › peer-review

57 Scopus citations

Abstract

Direct laser writing via two photon polymerization has enabled previously unavailable degrees of freedom in the additive fabrication of micro-to-meso scale structures. The structures produced by these techniques are ideally suited to create optical devices which operate from the THz regime to the near infrared spectrum into the visible spectral range. Here we report on the infrared dielectric response of two monomers IP-dip and IP-L after polymerization which are frequently employed in commercial two photon lithography tools from nanoscribe over the spectral range of 250 cm^-1 to 6000 cm^-1. A parameterized dielectric function model is presented and discussed.

Original language	English (US)
Pages (from-to)	888-894
Number of pages	7
Journal	Optical Materials Express
Volume	7
Issue number	3
DOIs	https://doi.org/10.1364/OME.7.000888
State	Published - Mar 1 2017
Externally published	Yes

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials

Access to Document

10.1364/OME.7.000888

Cite this

@article{b3b7beac059e4e9c9350a4a3a999b2b7,

title = "Infrared dielectric response of nanoscribe IP-dip and IP-L monomers after polymerization from 250 cm-1 to 6000 cm-1",

abstract = "Direct laser writing via two photon polymerization has enabled previously unavailable degrees of freedom in the additive fabrication of micro-to-meso scale structures. The structures produced by these techniques are ideally suited to create optical devices which operate from the THz regime to the near infrared spectrum into the visible spectral range. Here we report on the infrared dielectric response of two monomers IP-dip and IP-L after polymerization which are frequently employed in commercial two photon lithography tools from nanoscribe over the spectral range of 250 cm-1 to 6000 cm-1. A parameterized dielectric function model is presented and discussed.",

author = "Fullager, \{Daniel B.\} and Boreman, \{Glenn D.\} and Tino Hofmann",

note = "Publisher Copyright: {\textcopyright} 2017 Optical Society of America.",

year = "2017",

month = mar,

day = "1",

doi = "10.1364/OME.7.000888",

language = "English (US)",

volume = "7",

pages = "888--894",

journal = "Optical Materials Express",

issn = "2159-3930",

publisher = "Optica Publishing Group (formerly OSA)",

number = "3",

}

TY - JOUR

T1 - Infrared dielectric response of nanoscribe IP-dip and IP-L monomers after polymerization from 250 cm-1 to 6000 cm-1

AU - Fullager, Daniel B.

AU - Boreman, Glenn D.

AU - Hofmann, Tino

PY - 2017/3/1

Y1 - 2017/3/1

N2 - Direct laser writing via two photon polymerization has enabled previously unavailable degrees of freedom in the additive fabrication of micro-to-meso scale structures. The structures produced by these techniques are ideally suited to create optical devices which operate from the THz regime to the near infrared spectrum into the visible spectral range. Here we report on the infrared dielectric response of two monomers IP-dip and IP-L after polymerization which are frequently employed in commercial two photon lithography tools from nanoscribe over the spectral range of 250 cm-1 to 6000 cm-1. A parameterized dielectric function model is presented and discussed.

AB - Direct laser writing via two photon polymerization has enabled previously unavailable degrees of freedom in the additive fabrication of micro-to-meso scale structures. The structures produced by these techniques are ideally suited to create optical devices which operate from the THz regime to the near infrared spectrum into the visible spectral range. Here we report on the infrared dielectric response of two monomers IP-dip and IP-L after polymerization which are frequently employed in commercial two photon lithography tools from nanoscribe over the spectral range of 250 cm-1 to 6000 cm-1. A parameterized dielectric function model is presented and discussed.

UR - https://www.scopus.com/pages/publications/85014091264

UR - https://www.scopus.com/pages/publications/85014091264#tab=citedBy

U2 - 10.1364/OME.7.000888

DO - 10.1364/OME.7.000888

M3 - Article

AN - SCOPUS:85014091264

SN - 2159-3930

VL - 7

SP - 888

EP - 894

JO - Optical Materials Express

JF - Optical Materials Express

IS - 3

ER -

Infrared dielectric response of nanoscribe IP-dip and IP-L monomers after polymerization from 250 cm^-1 to 6000 cm^-1

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this