Integration of high-K dielectrics into sub-65nm CMOS technology: Requirements and challenges

Durgamadhab Misra, N. A. Choudhury, R. Garg, P. Srinivasan

Research output: Contribution to conferencePaperpeer-review

4 Scopus citations

Fingerprint

Dive into the research topics of 'Integration of high-K dielectrics into sub-65nm CMOS technology: Requirements and challenges'. Together they form a unique fingerprint.

Engineering & Materials Science