Interactive system for wafer emissivity estimation as determined in an RTP chamber

Maurizio Fulco; Onofrio L. Russo; Sergey Belikov; Walter Kosonocky

doi:10.1557/proc-470-29

Interactive system for wafer emissivity estimation as determined in an RTP chamber

Maurizio Fulco, Onofrio L. Russo, Sergey Belikov, Walter Kosonocky

Physics

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

We demonstrate an interactive software system in which the emissivity of wafers can be estimated in situ using different models. The system allows the data taker to introduce a choice of design parameters necessary for the control of temperature uniformity. The objective of the interactive system is to obtain a better estimation of the wavelength dependent emissivity by using existing data such as integrated emissivity, for example, as input information. Results for some of the models are presented and compared to show differences in the models chosen. The principle advantage offered by the system are the likely prospects of a realistic improvement and confident assessment for real time temperature measurement and control in an RTP environment.

Original language	English (US)
Pages (from-to)	29-34
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	470
DOIs	https://doi.org/10.1557/proc-470-29
State	Published - 1997
Event	Proceedings of the 1997 MRS Spring Meeting - San Francisco, CA, USA Duration: Apr 1 1997 → Apr 4 1997

All Science Journal Classification (ASJC) codes

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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title = "Interactive system for wafer emissivity estimation as determined in an RTP chamber",

abstract = "We demonstrate an interactive software system in which the emissivity of wafers can be estimated in situ using different models. The system allows the data taker to introduce a choice of design parameters necessary for the control of temperature uniformity. The objective of the interactive system is to obtain a better estimation of the wavelength dependent emissivity by using existing data such as integrated emissivity, for example, as input information. Results for some of the models are presented and compared to show differences in the models chosen. The principle advantage offered by the system are the likely prospects of a realistic improvement and confident assessment for real time temperature measurement and control in an RTP environment.",

author = "Maurizio Fulco and Russo, {Onofrio L.} and Sergey Belikov and Walter Kosonocky",

year = "1997",

doi = "10.1557/proc-470-29",

language = "English (US)",

volume = "470",

pages = "29--34",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Proceedings of the 1997 MRS Spring Meeting ; Conference date: 01-04-1997 Through 04-04-1997",

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TY - JOUR

T1 - Interactive system for wafer emissivity estimation as determined in an RTP chamber

AU - Fulco, Maurizio

AU - Russo, Onofrio L.

AU - Belikov, Sergey

AU - Kosonocky, Walter

PY - 1997

Y1 - 1997

N2 - We demonstrate an interactive software system in which the emissivity of wafers can be estimated in situ using different models. The system allows the data taker to introduce a choice of design parameters necessary for the control of temperature uniformity. The objective of the interactive system is to obtain a better estimation of the wavelength dependent emissivity by using existing data such as integrated emissivity, for example, as input information. Results for some of the models are presented and compared to show differences in the models chosen. The principle advantage offered by the system are the likely prospects of a realistic improvement and confident assessment for real time temperature measurement and control in an RTP environment.

AB - We demonstrate an interactive software system in which the emissivity of wafers can be estimated in situ using different models. The system allows the data taker to introduce a choice of design parameters necessary for the control of temperature uniformity. The objective of the interactive system is to obtain a better estimation of the wavelength dependent emissivity by using existing data such as integrated emissivity, for example, as input information. Results for some of the models are presented and compared to show differences in the models chosen. The principle advantage offered by the system are the likely prospects of a realistic improvement and confident assessment for real time temperature measurement and control in an RTP environment.

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U2 - 10.1557/proc-470-29

DO - 10.1557/proc-470-29

M3 - Conference article

AN - SCOPUS:0031333965

SN - 0272-9172

VL - 470

SP - 29

EP - 34

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1997 MRS Spring Meeting

Y2 - 1 April 1997 through 4 April 1997

ER -

Interactive system for wafer emissivity estimation as determined in an RTP chamber

Abstract

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