Interactive system for wafer emissivity estimation as determined in an RTP chamber

Maurizio Fulco, Onofrio L. Russo, Sergey Belikov, Walter Kosonocky

Research output: Contribution to journalConference articlepeer-review

Abstract

We demonstrate an interactive software system in which the emissivity of wafers can be estimated in situ using different models. The system allows the data taker to introduce a choice of design parameters necessary for the control of temperature uniformity. The objective of the interactive system is to obtain a better estimation of the wavelength dependent emissivity by using existing data such as integrated emissivity, for example, as input information. Results for some of the models are presented and compared to show differences in the models chosen. The principle advantage offered by the system are the likely prospects of a realistic improvement and confident assessment for real time temperature measurement and control in an RTP environment.

Original languageEnglish (US)
Pages (from-to)29-34
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume470
DOIs
StatePublished - 1997
EventProceedings of the 1997 MRS Spring Meeting - San Francisco, CA, USA
Duration: Apr 1 1997Apr 4 1997

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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