Keyphrases
Antenna
100%
Gate Stack
100%
Plasma Oxidation
100%
ZrO2-Al2O3
100%
Atomic Layer Deposited
100%
Interface States
100%
State-space Reduction
100%
High-k Gate Stack
50%
X-ray Photoelectron Spectroscopy
37%
Electrical Properties
25%
Breakdown Characteristics
25%
Interfacial Layer
25%
Al2O3-ZrO2
25%
Spectroscopic Measurement
12%
Dielectric
12%
Atomic Layer Deposition
12%
Dielectric Breakdown
12%
Oxidation Treatment
12%
Interface State Density
12%
Reliability Characteristics
12%
Layer Formation
12%
Equivalent Oxide Thickness
12%
Metal-oxide-semiconductor Capacitor (MOSCAP)
12%
High-k Interface
12%
Leakage Current Density
12%
Densification
12%
Low Leakage Current
12%
Low Hysteresis
12%
Hand X-ray
12%
Reliable Feature
12%
Material Science
Zirconia
100%
Oxidation Reaction
100%
Al2O3
100%
X-Ray Photoelectron Spectroscopy
37%
Density
25%
Dielectric Material
12%
Oxide Compound
12%
Capacitor
12%
Metal Oxide
12%
Electrical Breakdown
12%
Oxide Semiconductor
12%