TY - GEN
T1 - Investigation of Defect States of HfO2 and SiO2 on p type Silicon using THz Spectroscopy
AU - Sengupta, Amartya
AU - Altan, Hakan
AU - Bandyopadhyay, Aparajita
AU - Federici, John F.
AU - Grebel, H.
AU - Pham, Daniel
PY - 2005
Y1 - 2005
N2 - As a non contact characterization tool, visible pump - THz probe spectroscopy provides distinct spectra for high κ gate dielectrics. The interfacial defect density is found to be larger for HfO2 than for SiO2.
AB - As a non contact characterization tool, visible pump - THz probe spectroscopy provides distinct spectra for high κ gate dielectrics. The interfacial defect density is found to be larger for HfO2 than for SiO2.
UR - http://www.scopus.com/inward/record.url?scp=85088723205&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85088723205&partnerID=8YFLogxK
U2 - 10.1364/fio.2005.fwf1
DO - 10.1364/fio.2005.fwf1
M3 - Conference contribution
AN - SCOPUS:85088723205
SN - 1557527970
SN - 9781557527974
T3 - Optics InfoBase Conference Papers
BT - Frontiers in Optics, FiO 2005
PB - Optical Society of America (OSA)
T2 - Frontiers in Optics, FiO 2005
Y2 - 16 October 2005 through 21 October 2005
ER -