Investigation of plasma enhanced chemically vapor deposited tantalum on high strength steels

Y. Suh, W. Chen, S. Maeng, R. Levy, H. Thridandam, K. Cuthill, T. Gaffhey

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

As a chromium replacement candidate for coating protection of high strength steels, tantalum is environmentally friendly and exhibits excellent physical and chemical properties such as a high melting point, good ductility, and excellent corrosion resistance in aggressive environments. This work currently investigates the use of plasma enhanced chemical vapor deposition (PECVD) to produce high quality Ta coatings on high strength steel substrates. This deposition process promises to provide good throughput, low cost, conformal step coverage, and coatings with desirable properties and performance. In this study, tantalum chloride (TaCl5) and hydrogen (H2) have been selected as the preferred precursor and the reactant gas for the reduction reaction and a PECVD reactor with 13.56 MHz RF power source was used to carry out the coating experiments. The interrelationships governing the growth kinetics, compositions, and coating properties have been established as a function of deposition temperature, total pressure, RF input power and reactant concentration. The PECVD Ta coatings have also been characterized with respect to their chemical, structural, and morphological properties. Results indicate that the coatings consist essentially of pure tantalum with trace amounts of oxygen, carbon, and chlorine. The SEM results revealed that the coatings exhibit perfectly conformal coverage while the XRR and XRD results indicated that the coatings are dense and exhibit mostly the β-Ta phase.

Original languageEnglish (US)
Title of host publicationMaterials Science and Technology Conference and Exhibition, MS and T'07 - "Exploring Structure, Processing, and Applications Across Multiple Materials Systems"
Pages3424-3433
Number of pages10
StatePublished - Dec 1 2007
EventMaterials Science and Technology Conference and Exhibition, MS and T'07 - "Exploring Structure, Processing, and Applications Across Multiple Materials Systems" - Detroit, MI, United States
Duration: Sep 16 2007Sep 20 2007

Publication series

NameMaterials Science and Technology Conference and Exhibition, MS and T'07 - "Exploring Structure, Processing, and Applications Across Multiple Materials Systems"
Volume5

Other

OtherMaterials Science and Technology Conference and Exhibition, MS and T'07 - "Exploring Structure, Processing, and Applications Across Multiple Materials Systems"
CountryUnited States
CityDetroit, MI
Period9/16/079/20/07

All Science Journal Classification (ASJC) codes

  • Industrial and Manufacturing Engineering
  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Science(all)
  • Condensed Matter Physics

Keywords

  • Plasma-enhanced CVD
  • Tantalum
  • Tantalum chloride

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