Ionization and mass spectrometry of decaborane for shallow implantation of boron into silicon

Engineering & Materials Science

• Ionization 100%
• Mass spectrometry 98%
• Boron 87%
• Ions 70%
• Silicon 60%
• Impact ionization 47%
• Atoms 47%
• Electrons 46%
• Ion beams 43%
• Ion sources 23%
• Ion implantation 20%
• Electric space charge 20%
• Molecules 15%
• Temperature 6%
• Experiments 5%

Chemical Compounds

• Boron Atom 66%
• Ionization 61%
• Mass Spectrometry 51%
• Electron Impact Ionization 40%
• Cluster Ion 37%
• Energy 36%
• Ion Beam 33%
• Space Charge 19%
• Ion 18%
• Mass Spectrum 13%
• Electron Particle 8%
• Molecule 5%