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Ionized cluster beam deposition and thin insulating films
Sosnowski Marek, Yamada Isao
Electrical and Computer Engineering
Research output
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Contribution to journal
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Article
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peer-review
10
Scopus citations
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Keyphrases
Cluster Beam Deposition
100%
Ionized Cluster Beam
100%
Insulating Thin Films
100%
Fluorite
33%
Cluster Beam Technique
33%
Physical Properties
16%
Crystalline Structure
16%
Structure-property Relationships
16%
Film Properties
16%
Deposition Methods
16%
Heterostructure
16%
Epitaxial
16%
High-quality Films
16%
Device Fabrication
16%
Low Substrate Temperature
16%
Deposited Film
16%
TiO2-Al2O3
16%
Vacuum Deposition
16%
Metal-semiconductor-metal
16%
Accelerating Voltage
16%
Film Deposition
16%
Metal-insulator
16%
Thin Film Properties
16%
High Substrate Temperature
16%
Beam Characteristics
16%
Beam Method
16%
Engineering
Thin Films
100%
Substrate Temperature
100%
Energy Engineering
50%
Film Property
50%
Heterostructures
50%
Process Parameter
50%
Deposited Film
50%
Deposition Method
50%
Ionized Specie
50%
Material Science
Film
100%
Thin Films
40%
Physical Property
20%
Crystal Structure
20%
Heterojunction
20%
Titanium Dioxide
20%
Device Fabrication
20%
Al2O3
20%
Vacuum Deposition
20%
Film Deposition
20%
Physics
Thin Films
100%
Crystal Structure
50%
Vacuum Deposition
50%
Earth and Planetary Sciences
Thin Films
100%
Vacuum Deposition
50%