Lamellar crystallization of silicon for 3-dimensional integration

Keyphrases

• Crystallization 100%
• Lamellae 100%
• Three-dimensional Integration 100%
• Crystalline Region 66%
• Single Crystal 33%
• Semiconductors 33%
• Semiconductor Devices 33%
• Submicron 33%
• Amorphous Silicon 33%
• Single-crystalline 33%
• Laser Pulse 33%
• Partial Melting 33%
• Thermal Budget 33%
• 532 Nm Laser 33%
• Device Layer 33%
• Insulating Layer 33%
• Amorphous Substrate 33%
• Without Heating 33%

Material Science

• Silicon 100%
• Semiconductor Device 50%
• Amorphous Silicon 50%
• Laser Pulse 50%
• Single Crystal 50%