TY - GEN
T1 - Large-scale deposition of transparent conducting oxides by hollow cathode sputtering
AU - Delahoy, Alan E.
AU - Jansen, Kai
AU - Robinson, Chris
AU - Varvar, Anthony
AU - Fabiano, Paul
AU - Kappera, Rajesh
AU - Guo, Sheyu
AU - Li, Hongmei
AU - Yang, Shaohua
PY - 2012
Y1 - 2012
N2 - This paper reviews the status of hollow cathode sputtering as an evolving technology for production of thin-film transparent conducting oxides for PV applications. A large market segment for PV TCOs is represented by thin-film a-Si:H and tandem a-Si:H/nc-Si:H modules. For superstrate devices, textured SnO 2:F produced on-line by APCVD is currently the market leader, although alternative off-line methods and materials are now emerging. In particular, zinc oxide can be produced by LPCVD, APCVD, magnetron sputtering, and hollow cathode sputtering (HCS). HCS is a stable process featuring low-cost metal targets and a soft deposition process. We discuss the deposition principles and the film results obtained using linear hollow cathodes 0.5 m and 1.0 m in length. We report the direct deposition of highly textured doped ZnO having an electron mobility in excess of 50 cm 2/Vs. The production cost of textured ZnO is estimated for several competing techniques.
AB - This paper reviews the status of hollow cathode sputtering as an evolving technology for production of thin-film transparent conducting oxides for PV applications. A large market segment for PV TCOs is represented by thin-film a-Si:H and tandem a-Si:H/nc-Si:H modules. For superstrate devices, textured SnO 2:F produced on-line by APCVD is currently the market leader, although alternative off-line methods and materials are now emerging. In particular, zinc oxide can be produced by LPCVD, APCVD, magnetron sputtering, and hollow cathode sputtering (HCS). HCS is a stable process featuring low-cost metal targets and a soft deposition process. We discuss the deposition principles and the film results obtained using linear hollow cathodes 0.5 m and 1.0 m in length. We report the direct deposition of highly textured doped ZnO having an electron mobility in excess of 50 cm 2/Vs. The production cost of textured ZnO is estimated for several competing techniques.
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U2 - 10.1557/opl.2011.836
DO - 10.1557/opl.2011.836
M3 - Conference contribution
AN - SCOPUS:84455212164
SN - 9781605113005
T3 - Materials Research Society Symposium Proceedings
SP - 35
EP - 46
BT - Advanced Materials Processing for Scalable Solar-Cell Manufacturing
T2 - 2011 MRS Spring Meeting
Y2 - 25 April 2011 through 29 April 2011
ER -