Keyphrases
Temperature Range
100%
Low Pressure Chemical Vapor Deposition (LPCVD)
100%
Silicon Carbide
100%
Deposition Rate
100%
High Temperature
50%
Mass Transfer
50%
Young's Modulus
50%
Si-C
50%
Activation Energy
50%
Square Root
50%
Optical Transmission
50%
Deposition Temperature
50%
Rapid Rate
50%
Arrhenius Behavior
50%
Chamber Pressure
50%
Carbon Content
50%
Film Stress
50%
Free-standing Membrane
50%
Homolytic Cleavage
50%
Amorphous SiC Films
50%
Single Precursor
50%
Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Temperature Range
100%
Deposition Rate
100%
Limitations
50%
Flow Rate
50%
Young's Modulus
50%
Activation Energy
50%
Mols
50%
Square Root
50%
Arrhenius
50%
Optical Transmission
50%
Deposition Temperature
50%
Flow Pressure
50%
Chamber Pressure
50%
Material Science
Film
100%
Low Pressure Chemical Vapor Deposition
100%
Silicon Carbide
100%
Amorphous Material
50%
Young's Modulus
50%
Activation Energy
50%
Chemical Engineering
Silicon Carbide
100%
Low Pressure Chemical Vapor Deposition
100%
Deposition Rate
100%