Low pressure chemical vapor deposition of silicon nitride using the environmentally friendly tris(dimethylamino)silane precursor

R. A. Levy, X. Lin, J. M. Grow, H. J. Boeglin, R. Shalvoy

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Fingerprint

Dive into the research topics of 'Low pressure chemical vapor deposition of silicon nitride using the environmentally friendly tris(dimethylamino)silane precursor'. Together they form a unique fingerprint.

Keyphrases

Engineering

Material Science

Chemical Engineering