Keyphrases
Condition Value
25%
Deposition Temperature
100%
Dimethylamino
100%
Environmentally Benign
25%
Environmentally Friendly
100%
Etching Rate
25%
Film Density
25%
Flow Ratio
25%
FTIR Spectra
25%
Gas-phase nucleation
25%
Growth Kinetics
25%
Low Pressure Chemical Vapor Deposition (LPCVD)
100%
NH3 Concentration
25%
Nucleation Effect
25%
Optimized Processing
25%
Processing Conditions
25%
Refractive Index
25%
Saturation Value
25%
Silane
50%
Silane Precursor
100%
Silicon Nitride
100%
Silicon Nitride Film
25%
Total Pressure
25%
Tris
100%
Young's Modulus
25%
Engineering
Chemical Vapor Deposition
100%
Deposition Temperature
100%
Etch Rate
25%
Film Density
25%
Gas-Phase
25%
Growth Kinetics
25%
Nitride
100%
Processing Condition
25%
Refractive Index
25%
Saturation Value
25%
Tensiles
25%
Vapor Deposition
100%
Young's Modulus
25%
Material Science
Amorphous Material
20%
Density
20%
Film
100%
Low Pressure Chemical Vapor Deposition
100%
Nucleation
20%
Refractive Index
20%
Silane
100%
Silicon Nitride
100%
Young's Modulus
20%
Chemical Engineering
Low Pressure Chemical Vapor Deposition
100%
Silane
100%
Silicon Nitride
100%