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LOW PRESSURE SELECTIVE CHEMICAL VAPOR DEPOSITION OF TUNGSTEN.
M. L. Green,
R. A. Levy
Research output
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peer-review
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Dive into the research topics of 'LOW PRESSURE SELECTIVE CHEMICAL VAPOR DEPOSITION OF TUNGSTEN.'. Together they form a unique fingerprint.
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Keyphrases
Barrier Layer
50%
Device Performance
50%
Film Processing
50%
Hydrogen Reduction
50%
Interconnect Metallization
50%
Low Pressure
100%
Low Temperature
50%
Selective Chemical Vapor Deposition
100%
Tungsten
100%
VLSI Technology
50%
Engineering
Barrier Layer
33%
Chemical Vapor Deposition
100%
Device Performance
33%
Hydrogen Reduction
33%
Interconnects
33%
Low-Temperature
33%
Metallizations
33%
Potential Application
33%
Vapor Deposition
100%
Chemical Engineering
Chemical Vapor Deposition
100%
Metallizing
33%
Vapor Deposition
100%
Material Science
Chemical Vapor Deposition
100%
Film
33%
Tungsten
100%