Measurement of stress in a synthetic diamond substrate using the photoelastic method

Hancheng Liang; Andrei Vescan; Erhard Kohn; Ken K. Chin

doi:10.1016/0925-9635(95)00455-6

Measurement of stress in a synthetic diamond substrate using the photoelastic method

Hancheng Liang, Andrei Vescan, Erhard Kohn, Ken K. Chin

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

The residual stress in a synthetic diamond substrate was analyzed using an automatic data acquisition and analysis system based on photoelastic principles. Digital image processing techniques were applied to improve the quality of the sensed images, to reduce noise and to determine the boundary of the measured samples. Methods were also introduced to calculate the birefringence phase difference and principal stress directions. The shearing stress difference method was applied to calculate the two-dimensional stress distribution.

Original language	English (US)
Pages (from-to)	664-668
Number of pages	5
Journal	Diamond and Related Materials
Volume	5
Issue number	6-8
DOIs	https://doi.org/10.1016/0925-9635(95)00455-6
State	Published - May 1996

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
General Chemistry
Mechanical Engineering
Materials Chemistry
Electrical and Electronic Engineering

Keywords

Diamond
Measurement
Photoelasticity
Stress

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10.1016/0925-9635(95)00455-6

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title = "Measurement of stress in a synthetic diamond substrate using the photoelastic method",

abstract = "The residual stress in a synthetic diamond substrate was analyzed using an automatic data acquisition and analysis system based on photoelastic principles. Digital image processing techniques were applied to improve the quality of the sensed images, to reduce noise and to determine the boundary of the measured samples. Methods were also introduced to calculate the birefringence phase difference and principal stress directions. The shearing stress difference method was applied to calculate the two-dimensional stress distribution.",

keywords = "Diamond, Measurement, Photoelasticity, Stress",

author = "Hancheng Liang and Andrei Vescan and Erhard Kohn and Chin, {Ken K.}",

year = "1996",

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T1 - Measurement of stress in a synthetic diamond substrate using the photoelastic method

AU - Liang, Hancheng

AU - Vescan, Andrei

AU - Kohn, Erhard

AU - Chin, Ken K.

PY - 1996/5

Y1 - 1996/5

N2 - The residual stress in a synthetic diamond substrate was analyzed using an automatic data acquisition and analysis system based on photoelastic principles. Digital image processing techniques were applied to improve the quality of the sensed images, to reduce noise and to determine the boundary of the measured samples. Methods were also introduced to calculate the birefringence phase difference and principal stress directions. The shearing stress difference method was applied to calculate the two-dimensional stress distribution.

AB - The residual stress in a synthetic diamond substrate was analyzed using an automatic data acquisition and analysis system based on photoelastic principles. Digital image processing techniques were applied to improve the quality of the sensed images, to reduce noise and to determine the boundary of the measured samples. Methods were also introduced to calculate the birefringence phase difference and principal stress directions. The shearing stress difference method was applied to calculate the two-dimensional stress distribution.

KW - Diamond

KW - Measurement

KW - Photoelasticity

KW - Stress

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U2 - 10.1016/0925-9635(95)00455-6

DO - 10.1016/0925-9635(95)00455-6

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AN - SCOPUS:0042355356

SN - 0925-9635

VL - 5

SP - 664

EP - 668

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 6-8

ER -

Measurement of stress in a synthetic diamond substrate using the photoelastic method

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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