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Metrology of scattering with angular limitation projection electron lithography masks
J. A. Liddle, M. I. Blakey, T. Saunders, R. C. Farrow, L. A. Fetter, C. S. Knurek, R. Kasica, A. E. Novembre, M. L. Peabody, D. M. Tennant, D. L. Windt, M. Postek
Research output: Contribution to journal › Article › peer-review
6
Scopus
citations