Microengineered sensors: A review

Durga Misra, W. N. Carr

Research output: Contribution to conferencePaperpeer-review

Abstract

Recently the application of bulk and surface processing of silicon related materials has made it possible to successfully fabricate micromechanical structures in the range of 0.5 to 500 microns, which exhibits unrestrained motion over at least one degree of freedom. The sculptural fabrication techniques can be used to realize a variety of measurement devices (microengineered sensors). This paper describes the recent developments in the area of design, fabrication and operation of these microengineered sensors. The possible integration of the sensing elements with the signalprocessing circuit on one chip (the so called smart sensors) is also being discussed briefly.

Original languageEnglish (US)
Pages92-97
Number of pages6
DOIs
StatePublished - Jan 1 1991
Event1991 Electro International Conference, ELECTR 1991 - New York, United States
Duration: Apr 16 1991Apr 18 1991

Conference

Conference1991 Electro International Conference, ELECTR 1991
CountryUnited States
CityNew York
Period4/16/914/18/91

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Computer Networks and Communications
  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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