Micromechanical characterization of chemically vapor deposited ceramic films

J. M. Grow, R. A. Levy

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

In this study, nanoindentation is used to determine Young’s modulus of chemically vapor deposited films consisting of silicon carbide, silicon nitride, boron carbide, boron nitride, and silicon dioxide. Diethylsilane and ditertiarybutylsilane were used as precursors in the synthesis of the silicon-based material, while triethylamine borane complex was used for the boron-based material. The modulus of these films was observed to be dependent on the processing conditions and resulting composition of the deposits. For the silicon carbide, silicon nitride, boron carbide, and boron nitride films, the carbon content in the films was observed to increase significantly with higher deposition temperatures, resulting in a corresponding decrease in values of Young’s modulus. The composition of the silicon dioxide films was near stoichiometry over the investigated deposition temperature range (375–475 °C) with correspondingly small variations in the micromechanical properties. Subsequent annealing of these oxide films resulted in a significant increase in the values of Young’s modulus due to hydrogen and moisture removal.

Original languageEnglish (US)
Pages (from-to)2072-2078
Number of pages7
JournalJournal of Materials Research
Volume9
Issue number8
DOIs
StatePublished - Aug 1994

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Micromechanical characterization of chemically vapor deposited ceramic films'. Together they form a unique fingerprint.

Cite this