Micromechanical characterization of chemically vapor deposited ceramic films

Engineering & Materials Science

• Vapors 100%
• Characterization (materials science) 97%
• Boron carbide 64%
• Boron nitride 63%
• Elastic moduli 56%
• Silicon nitride 54%
• Silicon carbide 48%
• Silica 45%
• Stoichiometry 30%
• Chemical analysis 29%
• Oxide films 27%
• Nanoindentation 26%
• Boron 25%
• Annealing 22%
• Deposits 22%
• Moisture 19%
• Temperature 17%
• Hydrogen 17%
• Silicon 17%
• Carbon 16%

Physics & Astronomy

• vapors 84%
• ceramics 74%
• characterization 62%
• boron carbides 57%
• modulus of elasticity 53%
• boron nitrides 47%
• silicon nitrides 43%
• silicon carbides 43%
• silicon dioxide 34%
• boranes 34%
• moisture 23%
• nanoindentation 22%
• stoichiometry 21%
• deposits 20%
• oxide films 20%
• boron 19%
• synthesis 16%
• carbon 14%
• hydrogen 13%
• annealing 13%
• temperature 13%
• silicon 12%

Chemical Compounds

• Ceramic 85%
• Boron Nitride 84%
• Liquid Film 53%
• Silicon Dioxide 45%
• Silicon Carbide 41%
• Borane 20%
• Triethylamine 18%
• Reaction Stoichiometry 15%
• Annealing 14%
• Oxide 10%
• Hydrogen 9%
• Carbon Atom 8%