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Modeling of boron implantation into Si with decaborane ions
Zinetulla Insepov
, Marek Sosnowski
, Isao Yamada
Research output
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Contribution to journal
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Article
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peer-review
1
Scopus citations
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Keyphrases
Decaborane
100%
Boron Implantation
100%
Sputtering Yield
100%
Impact Energy
50%
High Energy
25%
Ultra-shallow Junction
25%
Si Surface
25%
Nonlinear Dependence
25%
Si Film
25%
Boron Atom
25%
MOS Devices
25%
Surface Atom
25%
Cluster Impact
25%
Carbon Substrate
25%
Cluster Ions
25%
Molecular Dynamics Model
25%
Ion Impact
25%
Chemistry
Liquid Film
100%
Molecular Dynamics
100%
Energetics
100%
Boron Atom
100%
Cluster Ion
100%
Ion Impact
100%
Material Science
Boron
100%
Film
50%