Abstract
A nanocrystalline silicon superlattice (nc-Si SLs) is a structure consisting of Si nanocrystal layers separated by nanometer-thick SiO2. A long range order in the nc-Si SL is obtained along the direction of growth by periodically alternating layers of Si nanocrystals and SiO2. A number of characterization techniques such as transmission electron microscopy (TEM) and atomic force microscopy (AFM), Auger elemental microanalysis. X-ray diffraction and X-ray small angle reflection have proved that the nc-Si SL exhibits a very narrow nanocrystal size distribution (less than 5% in average) and very abrupt and flat nc-Si SiO2 interfaces with a roughness of <4 angstroms. Conductance tunnel spectroscopy and capacitance-voltage (C-V) measurements showed that the nc-Si SL is a nearly defect free structure. The results hold promise for nc-Si SL quantum device applications.
Original language | English (US) |
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Pages (from-to) | 303-308 |
Number of pages | 6 |
Journal | Materials Science and Engineering B: Solid-State Materials for Advanced Technology |
Volume | 69 |
DOIs | |
State | Published - Jan 14 2000 |
Externally published | Yes |
Event | The European Materials Research Society 1999 Spring Meeting, Symposium I: Microcrystalline and Nanocrystalline Semiconductors - Strasbourg, France Duration: Jun 1 1999 → Jun 4 1999 |
All Science Journal Classification (ASJC) codes
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering