Nonlinear optical properties of ion implanted silicon nanostructures in silica

S. Vijayalakshmi, Haim Grebel, C. W. White

Research output: Contribution to journalArticlepeer-review

Abstract

Large nonlinear susceptibilities for ion implanted silicon in fused silica are discussed. The samples were prepared by implanting Si into fused silica matrices followed by annealing at 1100 °C in flowing Ar and 4% H2. After annealing, the cluster size was found to be 5-6 nm. The refractive index of the composite material was calculated to be 2.2 while the absorption coefficient of these samples exhibit two resonances: a strong absorption peak centered near 400 nm and another weaker absorption centered at 580 nm.

Original languageEnglish (US)
Pages (from-to)123-124
Number of pages2
JournalIQEC, International Quantum Electronics Conference Proceedings
StatePublished - Jan 1 1999

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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