Abstract
Nanocrystalline (nc)-Si/amorphous (a)-SiO2 superlattices (SLs) have been studied by transmission electron microscopy (TEM), Auger elemental microanalysis (TEM), Raman spectroscopy and optical reflection spectroscopy. Recrystallized Si/SiO2 SL is extremely stable under high temperature annealing (up to 1100 °C) and aggressive wet thermal oxidation: AEM and Raman spectroscopy of folded acoustic phonons (FAP) show no changes in periodicity in the growth direction and the abruptness of the nc-Si/a-SiO2 interfaces. Furthermore, Raman spectroscopy in the optical phonon range indicates that the annealing decreases the defect density in the Si nanocrystals (NCs), possibly due to Si-Si bond rearrangement accompanied by surface reconstruction and surface defect passivation by oxygen.
Original language | English (US) |
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Pages (from-to) | 671-676 |
Number of pages | 6 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 3491 |
DOIs | |
State | Published - 1998 |
Externally published | Yes |
Event | Proceedings of the 1998 International Conference on Applications of Photonic Technology, ICAPT - Ottawa, Can Duration: Jul 29 1998 → Jul 31 1998 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering