Oxygen ion implanted germanium - structural properties

N. M. Ravindra, T. Fink, W. Savin, T. P. Sjoreen, R. L. Pfeffer, L. G. Yerke, R. T. Lareau, J. G. Gualtieri, R. Lux, C. Wrenn

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8 Scopus citations

Abstract

Experimental studies of the structural and optical properties of oxygen implanted Ge have been reported here. The implantations were performed at different substrate temperatures in the range of liquid nitrogen to 370 °C. Measurement techniques such as Rutherford backscattering (RBS), secondary ion mass spectrometry (SIMS) and electron spin resonance (ESR) have been employed to characterize the nature of the samples. In each case, attempts have been made to compare the results obtained from similar measurements made on GeO2 glasses fused from melting very pure GeO2 powder at temperatures in the range of 1450-1650°C. For the first time in the literature, the formation of GeO2 glasses by ion implantation of oxygen into Ge has been evidenced here.

Original languageEnglish (US)
Pages (from-to)409-412
Number of pages4
JournalNuclear Inst. and Methods in Physics Research, B
Volume46
Issue number1-4
DOIs
StatePublished - Feb 1 1990

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Instrumentation

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