Performance enhancement of monolayer MoS2 transistors by atomic layer deposition of high-k dielectric assisted by Al2O3 seed layer

Guangyang Lin, Meng Qiang Zhao, Meng Jia, Jie Zhang, Peng Cui, Lincheng Wei, Haochen Zhao, A. T.Charlie Johnson, Lars Gundlach, Yuping Zeng

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