Photoablation: Schottky barriers on patterned Si surfaces

H. Grebel, K. J. Fang

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Easy to make, patterned, Schottky barriers are investigated. In particular, the following aspects have been considered: the patterning technique, the electrical barrier height, and potential usage as solar cells. Patterning of the Si surfaces was achieved by photoablation process using an UV excimer laser in a presence of various solutions. Using a 5 mW red HeNe laser launched at various angles on the Si surface we have found that patterned solar cells ablated with 2:3:100 of HF:HNO3:H2O were as much as 23% more efficient than nonpatterned cells.

Original languageEnglish (US)
Pages (from-to)367-370
Number of pages4
JournalJournal of Applied Physics
Volume77
Issue number1
DOIs
StatePublished - 1995

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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