Platinum and rhodium silicide-germanide optoelectronics

M. P. Lepselter, A. T. Fiory, N. M. Ravindra

Research output: Contribution to journalArticlepeer-review

13 Scopus citations


Since the introduction of SiO2/Si devices in the 1960s, the only basic change in the design of a MOSFET has been in the gate length. The channel thickness has fundamentally remained unchanged, as the inversion layer in a silicon MOSFET is still about 10 nm thick. Bipolar transistor base widths have been of sub-micron dimensions all this time. It is time for a new property to be exploited in concert with the high mobility strained-silicon channels and silicon-germanium alloys. This property is the inherently low parasitic series resistance of Schottky barrier contacts. Schottky contacts, beam leads, and microbridges, while originally developed in silicon, have been successfully integrated into compound semiconductors for optoelectronics. Reintroduction of these technologies in optoelectronics based on silicon-germanium is proposed. Several new applications using platinum and rhodium compounds of silicon and germanium are presented.

Original languageEnglish (US)
Pages (from-to)403-416
Number of pages14
JournalJournal of Electronic Materials
Issue number4
StatePublished - Apr 2008

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry


  • High speed
  • Infrared
  • Schottky-barrier detectors
  • SiGe alloy semiconductors
  • Wavelength selectability


Dive into the research topics of 'Platinum and rhodium silicide-germanide optoelectronics'. Together they form a unique fingerprint.

Cite this