Porous silicon multilayer mirrors and microcavity resonators for optoelectronic applications

S. Chan, L. Tsybeskov, P. M. Fauchet

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations

Abstract

Porous silicon multilayer structures are easily manufactured using a periodic current density square pulse during the electrochemical dissolution process. The difference in porosity profile, corresponding to a variation in current density, is attributed to a difference in refractive index. Manipulating the difference in refractive index, high quality optical filters can be made with a maximum reflectivity peak approx. 100%. The next logical step to further exploit these optical mirrors is to incorporate them into an LED device. The benefit of adding a multilayer mirror below a luminescent film of porous silicon is to significantly reduce the amount of light loss to the silicon substrate and increase the light output. However, oxidation is required to stabilize the as-anodized porous silicon film. This disrupts the overall index profile of the multilayer stack, causing the peak reflectance to blue shift. This phenomenon must be quantified and accounted before device implementation. We present a detailed study on the effects of oxidation temperature, gas environment, and annealing time of porous silicon multilayer structures in a device configuration.

Original languageEnglish (US)
Pages (from-to)117-122
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume536
StatePublished - Jan 1 1999
Externally publishedYes
EventProceedings of the 1998 MRS Fall Meeting - The Symposium 'Advanced Catalytic Materials-1998' - Boston, MA, USA
Duration: Nov 30 1998Dec 3 1998

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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