Post plasma oxidation processed ALD Al2O3/Hf1-xZrxO2 thin films on ge substrates: Reliability

M. N. Bhuyian, P. Shao, A. Sengupta, Y. Ding, D. Misra, K. Tapily, R. D. Clark, S. Consiglio, C. S. Wajda, G. J. Leusink

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Engineering & Materials Science

Chemical Compounds