Preparation and characterization of ultrathin porous silicon films

J. Von Behren, Leonid Tsybeskov, P. M. Fauchet

Research output: Contribution to journalArticlepeer-review

46 Scopus citations

Abstract

Light emitting porous silicon thin films with thicknesses from ∼0.1 to ∼100 μm were produced by electrochemical etching and subsequently lifted off the silicon wafer by an electropolishing step. The structural integrity of the thinner layers was maintained by deposition on sapphire windows where they remain attached by van der Waals or electrostatic forces. The procedure for manufacturing high quality layers and their structural and optical properties is discussed.

Original languageEnglish (US)
Number of pages1
JournalApplied Physics Letters
StatePublished - Dec 1 1995
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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