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Processing & characterization of thin films of Sio
2
on Si for integrated circuits
N. M. Ravindra
, W. N. Carr
, O. L. Russo
, D. Fathy
, A. R. Heyd
, K. Vedam
, J. Narayan
Physics
Research output
:
Contribution to journal
›
Article
›
peer-review
3
Scopus citations
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2
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Keyphrases
Integrated Circuits
100%
Electrolyte
100%
Silica
100%
Spectroscopic Ellipsometry
100%
Electroreflectance
100%
Low Temperature
50%
Nearly Free Electron States
50%
Breakdown Voltage
50%
High-resolution Transmission Electron Microscopy (HRTEM)
50%
Single-wavelength
50%
Engineering
Thin Films
100%
Integrated Circuit
100%
Reflectance
100%
Energy Engineering
50%
Transmissions
50%
High Resolution
50%
Low-Temperature
50%
Free Electron
50%
Breakdown Voltage
50%
Single Wavelength
50%
Material Science
Film
100%
Thin Films
100%
Electronic Circuit
100%
High-Resolution Transmission Electron Microscopy
50%