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Production of SCALPEL masks in a commercial mask facility
Chris L. Newport
, Jeffrey Parker
, K. Michael Smith
, Albert Benveniste
, Nam Wook Kim
, David Reyland
, Reginald Farrow
, Anthony Novembre
, Richard J. Kasica
, Chester S. Knurek
, Milton L. Peobody
, Len Rutberg
Research output
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peer-review
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Keyphrases
CD Metrology
11%
Cleaning Operations
11%
Commercial Facilities
22%
Data Development
11%
Defect Inspection
11%
DuPont
11%
Electron Beam Exposure System
11%
Electron Beam Lithography
100%
Exposure Standards
11%
Further Development
11%
Handling Operations
11%
High-resolution Patterning
11%
Inspection Tools
11%
Large-scale Fabrication
11%
Lithography System
11%
Lithography Technology
11%
Lithography Tool
11%
Mask Cleaning
11%
Mask Handling
11%
Mask Manufacturing
11%
Membrane Types
11%
Next Generation Lithography
11%
Optical Lithography
11%
Photomask
11%
Production Facilities
11%
Production Sequence
11%
Registration Metrology
11%
Semiconductor Industry
11%
Si Wafer
11%
Tool Use
11%
Engineering
Beam Lithography
12%
Defects
12%
Dupont
12%
Electron Optical Lithography
100%
High Resolution
12%
Limitations
100%
Lithography
12%
Optical Lithography
12%
Production Facility
12%
Si Wafer
12%