Pulsed-laser deposition of Si nanoclusters

S. Vijayalakshmi; M. A. George; J. Sturmann; H. Grebel

doi:10.1016/S0169-4332(97)00659-4

Pulsed-laser deposition of Si nanoclusters

S. Vijayalakshmi, M. A. George, J. Sturmann, H. Grebel

Research output: Contribution to journal › Article › peer-review

41 Scopus citations

Abstract

Growth properties of thin films of Si nanoclusters that were deposited on Si wafers by use of pulsed-laser ablation are discussed. The films were characterized by Atomic Force Microscopy (AFM) and X-ray Diffraction (XRD) and FTIR spectroscopy. Large nonlinear optical absorption was measured using a Free-Electron Laser at wavelengths near the infrared absorption band centered at 9.8 μm.

Original language	English (US)
Pages (from-to)	378-382
Number of pages	5
Journal	Applied Surface Science
Volume	127-129
DOIs	https://doi.org/10.1016/S0169-4332(97)00659-4
State	Published - May 1998

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces, Coatings and Films
Surfaces and Interfaces

Keywords

Nonlinear optical properties
Pulsed-laser deposition
Si nanoclusters

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10.1016/S0169-4332(97)00659-4

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@article{b424501f4be8464daca678094787495d,

title = "Pulsed-laser deposition of Si nanoclusters",

abstract = "Growth properties of thin films of Si nanoclusters that were deposited on Si wafers by use of pulsed-laser ablation are discussed. The films were characterized by Atomic Force Microscopy (AFM) and X-ray Diffraction (XRD) and FTIR spectroscopy. Large nonlinear optical absorption was measured using a Free-Electron Laser at wavelengths near the infrared absorption band centered at 9.8 μm.",

keywords = "Nonlinear optical properties, Pulsed-laser deposition, Si nanoclusters",

author = "S. Vijayalakshmi and George, {M. A.} and J. Sturmann and H. Grebel",

note = "Funding Information: The authors would like to thank Dr. J. Gilligan, Vanderbilt University for his suggestions on the FEL experiments. This work was supported by the supplemental applications program at Vanderbilt University through the Department of Defense MFEL program under contract number N00014-94-1-1023. ",

year = "1998",

month = may,

doi = "10.1016/S0169-4332(97)00659-4",

language = "English (US)",

volume = "127-129",

pages = "378--382",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

}

TY - JOUR

T1 - Pulsed-laser deposition of Si nanoclusters

AU - Vijayalakshmi, S.

AU - George, M. A.

AU - Sturmann, J.

AU - Grebel, H.

N1 - Funding Information: The authors would like to thank Dr. J. Gilligan, Vanderbilt University for his suggestions on the FEL experiments. This work was supported by the supplemental applications program at Vanderbilt University through the Department of Defense MFEL program under contract number N00014-94-1-1023.

PY - 1998/5

Y1 - 1998/5

N2 - Growth properties of thin films of Si nanoclusters that were deposited on Si wafers by use of pulsed-laser ablation are discussed. The films were characterized by Atomic Force Microscopy (AFM) and X-ray Diffraction (XRD) and FTIR spectroscopy. Large nonlinear optical absorption was measured using a Free-Electron Laser at wavelengths near the infrared absorption band centered at 9.8 μm.

AB - Growth properties of thin films of Si nanoclusters that were deposited on Si wafers by use of pulsed-laser ablation are discussed. The films were characterized by Atomic Force Microscopy (AFM) and X-ray Diffraction (XRD) and FTIR spectroscopy. Large nonlinear optical absorption was measured using a Free-Electron Laser at wavelengths near the infrared absorption band centered at 9.8 μm.

KW - Nonlinear optical properties

KW - Pulsed-laser deposition

KW - Si nanoclusters

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UR - http://www.scopus.com/inward/citedby.url?scp=0032070247&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(97)00659-4

DO - 10.1016/S0169-4332(97)00659-4

M3 - Article

AN - SCOPUS:0032070247

SN - 0169-4332

VL - 127-129

SP - 378

EP - 382

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Pulsed-laser deposition of Si nanoclusters

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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