Raman scattering from small particle size polycrystalline silicon

Zafar Iqbal, S. Vepřek, A. P. Webb, P. Capezzuto

Research output: Contribution to journalArticlepeer-review

282 Scopus citations

Abstract

Raman scattering measurements are reported on polycrystalline silicon films prepared in a hydrogen plasma at temperatures between 70 and 400°C. The spectra show several features which are correlated with X-ray diffraction measurements and assigned to crystalline and amorphous-like components.

Original languageEnglish (US)
Pages (from-to)993-996
Number of pages4
JournalSolid State Communications
Volume37
Issue number12
DOIs
StatePublished - Jan 1 1981

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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