Abstract
Raman scattering measurements are reported on polycrystalline silicon films prepared in a hydrogen plasma at temperatures between 70 and 400°C. The spectra show several features which are correlated with X-ray diffraction measurements and assigned to crystalline and amorphous-like components.
Original language | English (US) |
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Pages (from-to) | 993-996 |
Number of pages | 4 |
Journal | Solid State Communications |
Volume | 37 |
Issue number | 12 |
DOIs | |
State | Published - Mar 1981 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- General Chemistry
- Condensed Matter Physics
- Materials Chemistry