Raman scattering from small particle size polycrystalline silicon

Z. Iqbal, S. Vepřek, A. P. Webb, P. Capezzuto

Research output: Contribution to journalArticlepeer-review

297 Scopus citations


Raman scattering measurements are reported on polycrystalline silicon films prepared in a hydrogen plasma at temperatures between 70 and 400°C. The spectra show several features which are correlated with X-ray diffraction measurements and assigned to crystalline and amorphous-like components.

Original languageEnglish (US)
Pages (from-to)993-996
Number of pages4
JournalSolid State Communications
Issue number12
StatePublished - Mar 1981
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Condensed Matter Physics
  • Materials Chemistry


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