Abstract
We present a quantitative analysis of Raman scattering in various Si/Si1-xGex multilayered nanostructures with well-defined Ge composition (x) and layer thicknesses. Using Raman and transmission electron microscopy data, we discuss and model Si/SiGe intermixing and strain. By analyzing Stokes and anti-Stokes Raman signals, we calculate temperature and discuss heat dissipation in the samples under intense laser illumination.
| Original language | English (US) |
|---|---|
| Article number | 014305 |
| Journal | Journal of Applied Physics |
| Volume | 116 |
| Issue number | 1 |
| DOIs | |
| State | Published - Jul 7 2014 |
All Science Journal Classification (ASJC) codes
- General Physics and Astronomy