Rapid Growth of Monolayer MoSe2 Films for Large-Area Electronics

Danzhen Zhang, Chengyu Wen, John Brandon Mcclimon, Paul Masih Das, Qicheng Zhang, Grace A. Leone, Srinivas V. Mandyam, Marija Drndić, Alan T.Charlie Johnson, Meng Qiang Zhao

Research output: Contribution to journalArticlepeer-review

18 Scopus citations


The large-scale growth of semiconducting thin films on insulating substrates enables batch fabrication of atomically thin electronic and optoelectronic devices and circuits without film transfer. Here an efficient method to achieve rapid growth of large-area monolayer MoSe2 films based on spin coating of Mo precursor and assisted by NaCl is reported. Uniform monolayer MoSe2 films up to a few inches in size are obtained within a short growth time of 5 min. The as-grown monolayer MoSe2 films are of high quality with large grain size (up to 120 µm). Arrays of field-effect transistors are fabricated from the MoSe2 films through a photolithographic process; the devices exhibit high carrier mobility of ≈27.6 cm2 V–1 s–1 and on/off ratios of ≈105. The findings provide insight into the batch production of uniform thin transition metal dichalcogenide films and promote their large-scale applications.

Original languageEnglish (US)
Article number2001219
JournalAdvanced Electronic Materials
Issue number6
StatePublished - Jun 2021
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials


  • MoSe
  • NaCl promoters
  • monolayer films


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