Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics

Alan E. Delahoy; Sheyu Guo; John Cambridge; Rob Lyndall; J. A.Anna Selvan; Anamika Patel; Andrei Foustotchenko; Baosheng Sang

doi:10.1109/WCPEC.2006.279457

Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics

Alan E. Delahoy, Sheyu Guo, John Cambridge, Rob Lyndall, J. A.Anna Selvan, Anamika Patel, Andrei Foustotchenko, Baosheng Sang

Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

7 Scopus citations

Abstract

This paper reviews EPV's development of hardware and process technology to accomplish large area, high rate sputtering from metal targets in a reactive mode without target poisoning. The method is termed reactive-environment hollow cathode sputtering (RE-HCS) and makes use of the intense plasma confined in a hollow cathode. A linearly extended cathode is described, with one or more reactive gases delivered externally to the cathode. The basic operating characteristics of the cathode are described. The method is applied to the development of high performance transparent conducting oxides (TCOs) and other oxides and nitrides. The relevance of RE-HCS to the PV community is further demonstrated through the incorporation of TCOs and other materials produced by the method into thin film PV devices with competitive performance. Versions of the cathode suitable for large width industrial coating have been developed.

Original language	English (US)
Title of host publication	Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
Publisher	IEEE Computer Society
Pages	327-332
Number of pages	6
ISBN (Print)	1424400163, 9781424400164
DOIs	https://doi.org/10.1109/WCPEC.2006.279457
State	Published - Jan 1 2006
Event	2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 - Waikoloa, HI, United States Duration: May 7 2006 → May 12 2006

Publication series

Name	Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
Volume	1

Other

Other	2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
Country/Territory	United States
City	Waikoloa, HI
Period	5/7/06 → 5/12/06

All Science Journal Classification (ASJC) codes

Renewable Energy, Sustainability and the Environment
Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials
Materials Chemistry

Access to Document

10.1109/WCPEC.2006.279457

Cite this

Delahoy, A. E., Guo, S., Cambridge, J., Lyndall, R., Selvan, J. A. A., Patel, A., Foustotchenko, A., & Sang, B. (2006). Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 (pp. 327-332). Article 4059630 (Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4; Vol. 1). IEEE Computer Society. https://doi.org/10.1109/WCPEC.2006.279457

Delahoy, Alan E. ; Guo, Sheyu ; Cambridge, John et al. / Reactive-environment hollow cathode sputtering : Compound film production, and application to thin film photovoltaics. Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. pp. 327-332 (Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4).

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title = "Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics",

abstract = "This paper reviews EPV's development of hardware and process technology to accomplish large area, high rate sputtering from metal targets in a reactive mode without target poisoning. The method is termed reactive-environment hollow cathode sputtering (RE-HCS) and makes use of the intense plasma confined in a hollow cathode. A linearly extended cathode is described, with one or more reactive gases delivered externally to the cathode. The basic operating characteristics of the cathode are described. The method is applied to the development of high performance transparent conducting oxides (TCOs) and other oxides and nitrides. The relevance of RE-HCS to the PV community is further demonstrated through the incorporation of TCOs and other materials produced by the method into thin film PV devices with competitive performance. Versions of the cathode suitable for large width industrial coating have been developed.",

author = "Delahoy, {Alan E.} and Sheyu Guo and John Cambridge and Rob Lyndall and Selvan, {J. A.Anna} and Anamika Patel and Andrei Foustotchenko and Baosheng Sang",

year = "2006",

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doi = "10.1109/WCPEC.2006.279457",

language = "English (US)",

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series = "Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4",

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booktitle = "Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4",

address = "United States",

note = "2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 ; Conference date: 07-05-2006 Through 12-05-2006",

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Delahoy, AE, Guo, S, Cambridge, J, Lyndall, R, Selvan, JAA, Patel, A, Foustotchenko, A & Sang, B 2006, Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics. in Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4., 4059630, Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4, vol. 1, IEEE Computer Society, pp. 327-332, 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4, Waikoloa, HI, United States, 5/7/06. https://doi.org/10.1109/WCPEC.2006.279457

Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics. / Delahoy, Alan E.; Guo, Sheyu; Cambridge, John et al.
Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. p. 327-332 4059630 (Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4; Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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AU - Delahoy, Alan E.

AU - Guo, Sheyu

AU - Cambridge, John

AU - Lyndall, Rob

AU - Selvan, J. A.Anna

AU - Patel, Anamika

AU - Foustotchenko, Andrei

AU - Sang, Baosheng

PY - 2006/1/1

Y1 - 2006/1/1

N2 - This paper reviews EPV's development of hardware and process technology to accomplish large area, high rate sputtering from metal targets in a reactive mode without target poisoning. The method is termed reactive-environment hollow cathode sputtering (RE-HCS) and makes use of the intense plasma confined in a hollow cathode. A linearly extended cathode is described, with one or more reactive gases delivered externally to the cathode. The basic operating characteristics of the cathode are described. The method is applied to the development of high performance transparent conducting oxides (TCOs) and other oxides and nitrides. The relevance of RE-HCS to the PV community is further demonstrated through the incorporation of TCOs and other materials produced by the method into thin film PV devices with competitive performance. Versions of the cathode suitable for large width industrial coating have been developed.

AB - This paper reviews EPV's development of hardware and process technology to accomplish large area, high rate sputtering from metal targets in a reactive mode without target poisoning. The method is termed reactive-environment hollow cathode sputtering (RE-HCS) and makes use of the intense plasma confined in a hollow cathode. A linearly extended cathode is described, with one or more reactive gases delivered externally to the cathode. The basic operating characteristics of the cathode are described. The method is applied to the development of high performance transparent conducting oxides (TCOs) and other oxides and nitrides. The relevance of RE-HCS to the PV community is further demonstrated through the incorporation of TCOs and other materials produced by the method into thin film PV devices with competitive performance. Versions of the cathode suitable for large width industrial coating have been developed.

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T3 - Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4

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ER -

Delahoy AE, Guo S, Cambridge J, Lyndall R, Selvan JAA, Patel A et al. Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society. 2006. p. 327-332. 4059630. (Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4). doi: 10.1109/WCPEC.2006.279457

Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics

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