FingerprintDive into the research topics of 'Reactive Ion Etching of SOI (SIMOX and ZMR) Silicon in Nitrogen Containing CF4+ O2 and SF6+ O2 Plasmas'. Together they form a unique fingerprint.
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C. R. Selvakumar, D. Misra, O. W. Purbo
Research output: Contribution to journal › Article › peer-review