Room temperature band-edge luminescence from silicon grains prepared by the recrystallization of mesoporous silicon

Karen L. Moore, Leonid Tsybeskov, Philippe M. Fauchet, Dennis G. Hall

Research output: Contribution to journalArticlepeer-review

Abstract

Room-temperature photoluminescence (PL) peaking at 1.1 eV has been found in electrochemically etched mesoporous silicon annealed at 950°C. Low-temperature PL spectra clearly show a fine structure related to phonon-assisted transitions in pure crystalline silicon (c-Si) and the absence of defect-related (e.g. P-line) and impurity-related (e.g. oxygen, boron) transitions. The maximum PL external quantum efficiency (EQE) is found to be better than 0.1% with a weak temperature dependence in the region from 12K to 400K. The PL intensity is a linear function of excitation intensity up to 100 W/cm2. The PL can be suppressed by an external electric field ≥ 105 V/cm. Room temperature electroluminescence (EL) related to the c-Si band-edge is also demonstrated under an applied bias ≤ 1.2 V and with a current density ≈ 20 mA/cm2. A model is proposed in which the radiative recombination originates from recrystallized Si grains within a non-stoichiometric Si-rich silicon oxide (SRSO) matrix.

Original languageEnglish (US)
Pages (from-to)517-522
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume452
StatePublished - Jan 1 1997
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

Fingerprint Dive into the research topics of 'Room temperature band-edge luminescence from silicon grains prepared by the recrystallization of mesoporous silicon'. Together they form a unique fingerprint.

Cite this