SCALPEL aerial image monitoring: Principles and application to space charge

G. M. Gallatin; R. C. Farrow; J. A. Liddle; W. K. Waskiewicz; M. M. Mkrtchyan; P. Orphanos; J. Felker; J. Kraus; C. J. Biddick; S. Stanton; A. E. Novembre; M. Blakey

doi:10.1116/1.1289544

SCALPEL aerial image monitoring: Principles and application to space charge

G. M. Gallatin, R. C. Farrow, J. A. Liddle, W. K. Waskiewicz, M. M. Mkrtchyan, P. Orphanos, J. Felker, J. Kraus, C. J. Biddick, S. Stanton, A. E. Novembre, M. Blakey

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

A real time direct aerial image monitoring approach was used as the basis for developing an automated self-calibration system for the high throughput projection electron beam tool, called SCALPEL. The approach utilizes information contained in an alignment signal generated by scanning the image of a mask grating over a corresponding wafer grating and detecting the backscatter electron signal. The net image blur can be accurately measured by carefully averaging the repeated scans.

Original language	English (US)
Pages (from-to)	2560-2564
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	18
Issue number	5
DOIs	https://doi.org/10.1116/1.1289544
State	Published - Sep 2000
Externally published	Yes

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1289544

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Gallatin, G. M., Farrow, R. C., Liddle, J. A., Waskiewicz, W. K., Mkrtchyan, M. M., Orphanos, P., Felker, J., Kraus, J., Biddick, C. J., Stanton, S., Novembre, A. E., & Blakey, M. (2000). SCALPEL aerial image monitoring: Principles and application to space charge. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18(5), 2560-2564. https://doi.org/10.1116/1.1289544

@article{90e39529768541099c3e3b15ecef4012,

title = "SCALPEL aerial image monitoring: Principles and application to space charge",

abstract = "A real time direct aerial image monitoring approach was used as the basis for developing an automated self-calibration system for the high throughput projection electron beam tool, called SCALPEL. The approach utilizes information contained in an alignment signal generated by scanning the image of a mask grating over a corresponding wafer grating and detecting the backscatter electron signal. The net image blur can be accurately measured by carefully averaging the repeated scans.",

author = "Gallatin, \{G. M.\} and Farrow, \{R. C.\} and Liddle, \{J. A.\} and Waskiewicz, \{W. K.\} and Mkrtchyan, \{M. M.\} and P. Orphanos and J. Felker and J. Kraus and Biddick, \{C. J.\} and S. Stanton and Novembre, \{A. E.\} and M. Blakey",

year = "2000",

month = sep,

doi = "10.1116/1.1289544",

language = "English (US)",

volume = "18",

pages = "2560--2564",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "5",

}

Gallatin, GM, Farrow, RC, Liddle, JA, Waskiewicz, WK, Mkrtchyan, MM, Orphanos, P, Felker, J, Kraus, J, Biddick, CJ, Stanton, S, Novembre, AE & Blakey, M 2000, 'SCALPEL aerial image monitoring: Principles and application to space charge', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 5, pp. 2560-2564. https://doi.org/10.1116/1.1289544

TY - JOUR

T1 - SCALPEL aerial image monitoring

T2 - Principles and application to space charge

AU - Gallatin, G. M.

AU - Farrow, R. C.

AU - Liddle, J. A.

AU - Waskiewicz, W. K.

AU - Mkrtchyan, M. M.

AU - Orphanos, P.

AU - Felker, J.

AU - Kraus, J.

AU - Biddick, C. J.

AU - Stanton, S.

AU - Novembre, A. E.

AU - Blakey, M.

PY - 2000/9

Y1 - 2000/9

N2 - A real time direct aerial image monitoring approach was used as the basis for developing an automated self-calibration system for the high throughput projection electron beam tool, called SCALPEL. The approach utilizes information contained in an alignment signal generated by scanning the image of a mask grating over a corresponding wafer grating and detecting the backscatter electron signal. The net image blur can be accurately measured by carefully averaging the repeated scans.

AB - A real time direct aerial image monitoring approach was used as the basis for developing an automated self-calibration system for the high throughput projection electron beam tool, called SCALPEL. The approach utilizes information contained in an alignment signal generated by scanning the image of a mask grating over a corresponding wafer grating and detecting the backscatter electron signal. The net image blur can be accurately measured by carefully averaging the repeated scans.

UR - https://www.scopus.com/pages/publications/0034268749

UR - https://www.scopus.com/inward/citedby.url?scp=0034268749&partnerID=8YFLogxK

U2 - 10.1116/1.1289544

DO - 10.1116/1.1289544

M3 - Article

AN - SCOPUS:0034268749

SN - 1071-1023

VL - 18

SP - 2560

EP - 2564

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 5

ER -

SCALPEL aerial image monitoring: Principles and application to space charge

Abstract

All Science Journal Classification (ASJC) codes

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