SCALPEL mask blank fabrication

T. E. Saunders, M. I. Blakey, C. Caminos, G. R. Bogart, R. C. Farrow, C. S. Knurek, A. Kornblit, J. A. Liddle, A. E. Novembre, M. L. Peabody

Research output: Contribution to journalArticlepeer-review

Abstract

SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

Original languageEnglish (US)
Pages (from-to)248-255
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3874
StatePublished - Dec 1 1999
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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