SCALPEL mask blank fabrication

T. E. Saunders; M. I. Blakey; C. Caminos; G. R. Bogart; R. C. Farrow; C. S. Knurek; A. Kornblit; J. A. Liddle; A. E. Novembre; M. L. Peabody

SCALPEL mask blank fabrication

T. E. Saunders, M. I. Blakey, C. Caminos, G. R. Bogart, R. C. Farrow, C. S. Knurek, A. Kornblit, J. A. Liddle, A. E. Novembre, M. L. Peabody

Research output: Contribution to journal › Conference article › peer-review

Abstract

SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

Original language	English (US)
Pages (from-to)	248-255
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3874
State	Published - 1999
Externally published	Yes
Event	Proceedings of the 1999 Micromachining and Microfabrication Process Technology V - Santa Clara, CA, USA Duration: Sep 20 1999 → Sep 22 1999

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Cite this

@article{56c16d01d1a54079ad9dd928b33a0dca,

title = "SCALPEL mask blank fabrication",

abstract = "SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.",

author = "Saunders, {T. E.} and Blakey, {M. I.} and C. Caminos and Bogart, {G. R.} and Farrow, {R. C.} and Knurek, {C. S.} and A. Kornblit and Liddle, {J. A.} and Novembre, {A. E.} and Peabody, {M. L.}",

year = "1999",

language = "English (US)",

volume = "3874",

pages = "248--255",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Proceedings of the 1999 Micromachining and Microfabrication Process Technology V ; Conference date: 20-09-1999 Through 22-09-1999",

}

TY - JOUR

T1 - SCALPEL mask blank fabrication

AU - Saunders, T. E.

AU - Blakey, M. I.

AU - Caminos, C.

AU - Bogart, G. R.

AU - Farrow, R. C.

AU - Knurek, C. S.

AU - Kornblit, A.

AU - Liddle, J. A.

AU - Novembre, A. E.

AU - Peabody, M. L.

PY - 1999

Y1 - 1999

N2 - SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

AB - SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

UR - http://www.scopus.com/inward/record.url?scp=0033351720&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033351720&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0033351720

SN - 0277-786X

VL - 3874

SP - 248

EP - 255

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1999 Micromachining and Microfabrication Process Technology V

Y2 - 20 September 1999 through 22 September 1999

ER -

SCALPEL mask blank fabrication

Abstract

All Science Journal Classification (ASJC) codes

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