SCALPEL mask blank fabrication

T. E. Saunders; M. I. Blakey; C. Caminos; G. R. Bogart; R. C. Farrow; C. S. Knurek; A. Kornblit; J. A. Liddle; A. E. Novembre; M. L. Peabody

SCALPEL mask blank fabrication

T. E. Saunders, M. I. Blakey, C. Caminos, G. R. Bogart, R. C. Farrow, C. S. Knurek, A. Kornblit, J. A. Liddle, A. E. Novembre, M. L. Peabody

Research output: Contribution to journal › Article › peer-review

Abstract

SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

Original language	English (US)
Pages (from-to)	248-255
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3874
State	Published - Dec 1 1999
Externally published	Yes

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Cite this

@article{56c16d01d1a54079ad9dd928b33a0dca,

title = "SCALPEL mask blank fabrication",

abstract = "SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.",

author = "Saunders, {T. E.} and Blakey, {M. I.} and C. Caminos and Bogart, {G. R.} and Farrow, {R. C.} and Knurek, {C. S.} and A. Kornblit and Liddle, {J. A.} and Novembre, {A. E.} and Peabody, {M. L.}",

year = "1999",

month = dec,

day = "1",

language = "English (US)",

volume = "3874",

pages = "248--255",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

}

TY - JOUR

T1 - SCALPEL mask blank fabrication

AU - Saunders, T. E.

AU - Blakey, M. I.

AU - Caminos, C.

AU - Bogart, G. R.

AU - Farrow, R. C.

AU - Knurek, C. S.

AU - Kornblit, A.

AU - Liddle, J. A.

AU - Novembre, A. E.

AU - Peabody, M. L.

PY - 1999/12/1

Y1 - 1999/12/1

N2 - SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

AB - SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

UR - http://www.scopus.com/inward/record.url?scp=0033351720&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033351720&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0033351720

SN - 0277-786X

VL - 3874

SP - 248

EP - 255

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

ER -

SCALPEL mask blank fabrication

Abstract

All Science Journal Classification (ASJC) codes

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