SCALPEL mask blank fabrication

T. E. Saunders, M. I. Blakey, C. Caminos, G. R. Bogart, R. C. Farrow, C. S. Knurek, A. Kornblit, J. A. Liddle, A. E. Novembre, M. L. Peabody

Research output: Contribution to journalConference articlepeer-review


SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

Original languageEnglish (US)
Pages (from-to)248-255
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1999
Externally publishedYes
EventProceedings of the 1999 Micromachining and Microfabrication Process Technology V - Santa Clara, CA, USA
Duration: Sep 20 1999Sep 22 1999

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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