SCALPEL mask blank fabrication

T. E. Saunders; M. I. Blakey; C. Caminos; G. R. Bogart; R. C. Farrow; C. S. Knurek; A. Kornblit; J. A. Liddle; A. E. Novembre; M. L. Peabody

SCALPEL mask blank fabrication

T. E. Saunders
, M. I. Blakey
, C. Caminos
, G. R. Bogart
, R. C. Farrow
, C. S. Knurek
, A. Kornblit
, J. A. Liddle
, A. E. Novembre
, M. L. Peabody

Research output: Contribution to journal › Conference article › peer-review

Abstract

SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

Original language	English (US)
Pages (from-to)	248-255
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3874
State	Published - 1999
Externally published	Yes
Event	Proceedings of the 1999 Micromachining and Microfabrication Process Technology V - Santa Clara, CA, USA Duration: Sep 20 1999 → Sep 22 1999

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Cite this

@article{56c16d01d1a54079ad9dd928b33a0dca,

title = "SCALPEL mask blank fabrication",

abstract = "SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95\% yield while CRONOS produced over 100 blanks with comparable specifications.",

author = "Saunders, \{T. E.\} and Blakey, \{M. I.\} and C. Caminos and Bogart, \{G. R.\} and Farrow, \{R. C.\} and Knurek, \{C. S.\} and A. Kornblit and Liddle, \{J. A.\} and Novembre, \{A. E.\} and Peabody, \{M. L.\}",

year = "1999",

language = "English (US)",

volume = "3874",

pages = "248--255",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Proceedings of the 1999 Micromachining and Microfabrication Process Technology V ; Conference date: 20-09-1999 Through 22-09-1999",

}

TY - JOUR

T1 - SCALPEL mask blank fabrication

AU - Saunders, T. E.

AU - Blakey, M. I.

AU - Caminos, C.

AU - Bogart, G. R.

AU - Farrow, R. C.

AU - Knurek, C. S.

AU - Kornblit, A.

AU - Liddle, J. A.

AU - Novembre, A. E.

AU - Peabody, M. L.

PY - 1999

Y1 - 1999

N2 - SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

AB - SCALPEL (SCattering with Angular Limitation in Projection E-beam Lithography) mask blanks were fabricated in 100 mm format for use in the Lucent Technologies Proof-of-Lithography exposure system. Lucent fabricated over 500 blanks with a >95% yield while CRONOS produced over 100 blanks with comparable specifications.

UR - https://www.scopus.com/pages/publications/0033351720

UR - https://www.scopus.com/pages/publications/0033351720#tab=citedBy

M3 - Conference article

AN - SCOPUS:0033351720

SN - 0277-786X

VL - 3874

SP - 248

EP - 255

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1999 Micromachining and Microfabrication Process Technology V

Y2 - 20 September 1999 through 22 September 1999

ER -

SCALPEL mask blank fabrication

Abstract

All Science Journal Classification (ASJC) codes

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