SCALPEL masks

J. A. Liddle, M. Blakey, Kevin Bolan, R. Farrow, L. A. Fetter, Leslie C. Hopkins, H. A. Huggins, Herschel M. Marchman, Milton Peabody, Wayne M. Simpson, Regine G. Tarascon, George P. Watson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

The concept of a mask for a projection electron-beam lithography, based on the difference in scattering between two electron transparent materials - SCALPELTM, has been demonstrated previously. In order to translate this initial proof-of-concept int a mask suitable for a real lithography system, it is necessary to address a large number of issues. Because of the thin membranes employed, the design of the mask, its fabrication, robustness and dimensional stability are critical issues. Cleaning and repair strategies are also affected by the mask structure. Patterning, inspection and metrology are also vital to the production of a viable mask, but these are areas of importance common to all advanced lithographies.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsWilliam L. Brodsky, Gilbert V. Shelden
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages442-451
Number of pages10
ISBN (Print)0819416533
StatePublished - Dec 1 1994
Event14th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA, USA
Duration: Sep 14 1994Sep 16 1994

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2322
ISSN (Print)0277-786X

Other

Other14th Annual BACUS Symposium on Photomask Technology and Management
CitySanta Clara, CA, USA
Period9/14/949/16/94

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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