SCALPEL system

Steven D. Berger, Chris Biddick, M. Blakey, Kevin Bolan, Stephen Bowler, Kevin Brady, Ron Camarda, Wayne Connelly, R. Farrow, Joseph A. Felker, L. A. Fetter, Lloyd R. Harriott, al et al

Research output: Chapter in Book/Report/Conference proceedingConference contribution

12 Scopus citations

Abstract

We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsWilliam L. Brodsky, Gilbert V. Shelden
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages434-441
Number of pages8
ISBN (Print)0819416533
StatePublished - Dec 1 1994
Event14th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA, USA
Duration: Sep 14 1994Sep 16 1994

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2322
ISSN (Print)0277-786X

Other

Other14th Annual BACUS Symposium on Photomask Technology and Management
CitySanta Clara, CA, USA
Period9/14/949/16/94

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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