SCALPEL system

Steven D. Berger; Chris Biddick; M. Blakey; Kevin Bolan; Stephen Bowler; Kevin Brady; Ron Camarda; Wayne Connelly; R. Farrow; Joseph A. Felker; L. A. Fetter; Lloyd R. Harriott; al et al

SCALPEL system

Steven D. Berger, Chris Biddick, M. Blakey, Kevin Bolan, Stephen Bowler, Kevin Brady, Ron Camarda, Wayne Connelly, R. Farrow, Joseph A. Felker, L. A. Fetter, Lloyd R. Harriott, al et al

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

15 Scopus citations

Abstract

We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.

Original language	English (US)
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Editors	William L. Brodsky, Gilbert V. Shelden
Publisher	Society of Photo-Optical Instrumentation Engineers
Pages	434-441
Number of pages	8
ISBN (Print)	0819416533
State	Published - 1994
Externally published	Yes
Event	14th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA, USA Duration: Sep 14 1994 → Sep 16 1994

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	2322
ISSN (Print)	0277-786X

Other

Other	14th Annual BACUS Symposium on Photomask Technology and Management
City	Santa Clara, CA, USA
Period	9/14/94 → 9/16/94

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Cite this

Berger, S. D., Biddick, C., Blakey, M., Bolan, K., Bowler, S., Brady, K., Camarda, R., Connelly, W., Farrow, R., Felker, J. A., Fetter, L. A., Harriott, L. R., & et al, A. (1994). SCALPEL system. In W. L. Brodsky, & G. V. Shelden (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (pp. 434-441). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2322). Society of Photo-Optical Instrumentation Engineers.

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title = "SCALPEL system",

abstract = "We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.",

author = "Berger, {Steven D.} and Chris Biddick and M. Blakey and Kevin Bolan and Stephen Bowler and Kevin Brady and Ron Camarda and Wayne Connelly and R. Farrow and Felker, {Joseph A.} and Fetter, {L. A.} and Harriott, {Lloyd R.} and {et al}, al",

year = "1994",

language = "English (US)",

isbn = "0819416533",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "Society of Photo-Optical Instrumentation Engineers",

pages = "434--441",

editor = "Brodsky, {William L.} and Shelden, {Gilbert V.}",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

note = "14th Annual BACUS Symposium on Photomask Technology and Management ; Conference date: 14-09-1994 Through 16-09-1994",

}

Berger, SD, Biddick, C, Blakey, M, Bolan, K, Bowler, S, Brady, K, Camarda, R, Connelly, W, Farrow, R, Felker, JA, Fetter, LA, Harriott, LR & et al, A 1994, SCALPEL system. in WL Brodsky & GV Shelden (eds), Proceedings of SPIE - The International Society for Optical Engineering. Proceedings of SPIE - The International Society for Optical Engineering, vol. 2322, Society of Photo-Optical Instrumentation Engineers, pp. 434-441, 14th Annual BACUS Symposium on Photomask Technology and Management, Santa Clara, CA, USA, 9/14/94.

SCALPEL system. / Berger, Steven D.; Biddick, Chris; Blakey, M. et al.
Proceedings of SPIE - The International Society for Optical Engineering. ed. / William L. Brodsky; Gilbert V. Shelden. Society of Photo-Optical Instrumentation Engineers, 1994. p. 434-441 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2322).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - SCALPEL system

AU - Berger, Steven D.

AU - Biddick, Chris

AU - Blakey, M.

AU - Bolan, Kevin

AU - Bowler, Stephen

AU - Brady, Kevin

AU - Camarda, Ron

AU - Connelly, Wayne

AU - Farrow, R.

AU - Felker, Joseph A.

AU - Fetter, L. A.

AU - Harriott, Lloyd R.

AU - et al, al

PY - 1994

Y1 - 1994

N2 - We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.

AB - We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.

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UR - http://www.scopus.com/inward/citedby.url?scp=0028755161&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0028755161

SN - 0819416533

T3 - Proceedings of SPIE - The International Society for Optical Engineering

SP - 434

EP - 441

BT - Proceedings of SPIE - The International Society for Optical Engineering

A2 - Brodsky, William L.

A2 - Shelden, Gilbert V.

PB - Society of Photo-Optical Instrumentation Engineers

T2 - 14th Annual BACUS Symposium on Photomask Technology and Management

Y2 - 14 September 1994 through 16 September 1994

ER -

SCALPEL system

Abstract

Publication series

Other

All Science Journal Classification (ASJC) codes

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