Scheduling of single-arm cluster tools for an atomic layer deposition process with residency time constraints

Fajun Yang, Nai Qi Wu, Yan Qiao, Meng Chu Zhou, Zhi Wu Li

Research output: Contribution to journalArticlepeer-review

116 Scopus citations


In semiconductor manufacturing, there are wafer fabrication processes with wafer revisiting. Some of them must meet wafer residency time constraints. Taking atomic layer deposition (ALD) as a typical wafer revisiting process, this paper studies the challenging scheduling problem of single-arm cluster tools for the ALD process with wafer residency time constraints. It is found that there are only several scheduling strategies that are applicable to this problem and one needs to apply each of them to decide whether a feasible schedule can be found or not. This work, for each applicable strategy, performs the schedulability analysis and derives the schedulability conditions for such tools for the first time. It proposes scheduling algorithms to obtain an optimal schedule efficiently if such conditions are met. It finally gives illustrative examples to show the application of the proposed concepts and approach.

Original languageEnglish (US)
Article number7395391
Pages (from-to)502-516
Number of pages15
JournalIEEE Transactions on Systems, Man, and Cybernetics: Systems
Issue number3
StatePublished - Mar 2017

All Science Journal Classification (ASJC) codes

  • Software
  • Control and Systems Engineering
  • Human-Computer Interaction
  • Computer Science Applications
  • Electrical and Electronic Engineering


  • Cluster tool
  • discrete event system
  • robotic system
  • scheduling
  • semiconductor manufacturing


Dive into the research topics of 'Scheduling of single-arm cluster tools for an atomic layer deposition process with residency time constraints'. Together they form a unique fingerprint.

Cite this