Abstract
This work intends to schedule a dual-arm cluster tool for the atomic layer deposition (ALD) process with wafer residency time constraints. ALD is a typical wafer revisiting process. Based on the analysis of system properties, a novel scheduling strategy called modified 1-wafer cyclic scheduling is derived. With this strategy, necessary and sufficient schedulability conditions are established. If schedulable, scheduling algorithms are presented to obtain a feasible and optimal schedule. By the proposed method, a schedule can be found by just simple calculation. An illustrative example is given to show the application of the proposed approach.
Original language | English (US) |
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Title of host publication | 2013 IEEE International Conference on Automation Science and Engineering, CASE 2013 |
Pages | 868-873 |
Number of pages | 6 |
DOIs | |
State | Published - Dec 1 2013 |
Event | 2013 IEEE International Conference on Automation Science and Engineering, CASE 2013 - Madison, WI, United States Duration: Aug 17 2013 → Aug 20 2013 |
Other
Other | 2013 IEEE International Conference on Automation Science and Engineering, CASE 2013 |
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Country | United States |
City | Madison, WI |
Period | 8/17/13 → 8/20/13 |
All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Electrical and Electronic Engineering