Selective Silicide or Boride Film Formation by Reaction of Vapor Phase TiCl4 with Silicon or Boron

F. Schrey, R. A. Levy, P. K. Gallagher

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Fingerprint

Dive into the research topics of 'Selective Silicide or Boride Film Formation by Reaction of Vapor Phase TiCl4 with Silicon or Boron'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds