Self-assembly versus directed assembly of nanoparticles via pulsed laser induced dewetting of patterned metal films

Jason D. Fowlkes; Lou Kondic; Javier Diez; Yueying Wu; Philip D. Rack

doi:10.1021/nl200921c

Self-assembly versus directed assembly of nanoparticles via pulsed laser induced dewetting of patterned metal films

Jason D. Fowlkes, Lou Kondic, Javier Diez, Yueying Wu, Philip D. Rack

Mathematical Sciences

Research output: Contribution to journal › Article › peer-review

148 Scopus citations

Abstract

A nanoscale, synthetic perturbation was all that was required to nudge a natural, self-assembly process toward significantly higher order. Metallic thin film strips were transformed into nanoparticle arrays by nanosecond, liquid-phase dewetting. Arrays formed according to an evolving Rayleigh - Plateau instability, yet nanoparticle diameter and pitch were poorly controlled. However, by patterning a nanoscale sinusoid onto the original strip edge, a precise nanoparticle diameter and pitch emerged superseding the naturally evolving Rayleigh - Plateau instability.

Original language	English (US)
Pages (from-to)	2478-2485
Number of pages	8
Journal	Nano Letters
Volume	11
Issue number	6
DOIs	https://doi.org/10.1021/nl200921c
State	Published - Jun 8 2011

All Science Journal Classification (ASJC) codes

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

Keywords

Directed assembly
Rayleigh - Plateau
nanoscale lithography
pulsed laser melting
thin film dewetting

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10.1021/nl200921c

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title = "Self-assembly versus directed assembly of nanoparticles via pulsed laser induced dewetting of patterned metal films",

abstract = "A nanoscale, synthetic perturbation was all that was required to nudge a natural, self-assembly process toward significantly higher order. Metallic thin film strips were transformed into nanoparticle arrays by nanosecond, liquid-phase dewetting. Arrays formed according to an evolving Rayleigh - Plateau instability, yet nanoparticle diameter and pitch were poorly controlled. However, by patterning a nanoscale sinusoid onto the original strip edge, a precise nanoparticle diameter and pitch emerged superseding the naturally evolving Rayleigh - Plateau instability.",

keywords = "Directed assembly, Rayleigh - Plateau, nanoscale lithography, pulsed laser melting, thin film dewetting",

author = "Fowlkes, {Jason D.} and Lou Kondic and Javier Diez and Yueying Wu and Rack, {Philip D.}",

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AU - Fowlkes, Jason D.

AU - Kondic, Lou

AU - Diez, Javier

AU - Wu, Yueying

AU - Rack, Philip D.

PY - 2011/6/8

Y1 - 2011/6/8

N2 - A nanoscale, synthetic perturbation was all that was required to nudge a natural, self-assembly process toward significantly higher order. Metallic thin film strips were transformed into nanoparticle arrays by nanosecond, liquid-phase dewetting. Arrays formed according to an evolving Rayleigh - Plateau instability, yet nanoparticle diameter and pitch were poorly controlled. However, by patterning a nanoscale sinusoid onto the original strip edge, a precise nanoparticle diameter and pitch emerged superseding the naturally evolving Rayleigh - Plateau instability.

AB - A nanoscale, synthetic perturbation was all that was required to nudge a natural, self-assembly process toward significantly higher order. Metallic thin film strips were transformed into nanoparticle arrays by nanosecond, liquid-phase dewetting. Arrays formed according to an evolving Rayleigh - Plateau instability, yet nanoparticle diameter and pitch were poorly controlled. However, by patterning a nanoscale sinusoid onto the original strip edge, a precise nanoparticle diameter and pitch emerged superseding the naturally evolving Rayleigh - Plateau instability.

KW - Directed assembly

KW - Rayleigh - Plateau

KW - nanoscale lithography

KW - pulsed laser melting

KW - thin film dewetting

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JO - Nano Letters

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ER -

Self-assembly versus directed assembly of nanoparticles via pulsed laser induced dewetting of patterned metal films

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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